960化工网
Correction: Atomic layer deposition of a MoS2 film
Bo Liu,Jing Hua Teng,Shifeng Guo,Hong Yee Low,Kian Ping Loh
Nanoscale Pub Date : 10/07/2014 00:00:00 , DOI:10.1039/C4NR90076F
Abstract

Correction for ‘Atomic layer deposition of a MoS2 film’ by Lee Kheng Tan et al., Nanoscale, 2014, 6, 10584–10588.

平台客服
平台客服
平台在线客服