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High performance and gate-controlled GeSe/HfS2 negative differential resistance device†
Amir Muhammad Afzal,Muhammad Zahir Iqbal,Muhammad Waqas Iqbal,Thamer Alomayri,Ghulam Dastgeer,Yasir Javed,Naveed Akhter Shad,Rajwali Khan,M. Munir Sajid,Tasawar Abbas,Qudrat Ullah Khan
RSC Advances Pub Date : 01/05/2022 00:00:00 , DOI:10.1039/D1RA07276E
Abstract

Transition metal dichalcogenides (TMDs) have received significant attention owing to their thickness-dependent folded current–voltage (IdsVds) characteristics, which offer various threshold voltage values. Owing to these astonishing characteristics, TMDs based negative differential resistance (NDR) devices are preferred for the realization of multi-valued logic applications. In this study, an innovative and ground-breaking germanium selenide/hafnium disulfide (p-GeSe/n-HfS2) TMDs van der Waals heterostructure (vdWH) NDR device is designed. An extraordinary peak-to-valley current ratio (≈5.8) was estimated at room temperature and was used to explain the tunneling and diffusion currents by using the tunneling mechanism. In addition, the p-GeSe/n-HfS2 vdWH diode was used as a ternary inverter. The TMD vdWH diode, which can exhibit different band alignments, is a step forward on the road to developing high-performance multifunctional devices in electronics.

Graphical abstract: High performance and gate-controlled GeSe/HfS2 negative differential resistance device
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