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Mechano-fluorochromic behavior of AEE polyurethane films and their high sensitivity to halogen acid gas†
Kun Wang,Meng Wang,Hao Lu,Beibei Liu,Mingming Huang,Jiping Yang
RSC Advances Pub Date : 03/26/2019 00:00:00 , DOI:10.1039/C8RA10486G
Abstract

Three polyurethanes with different contents of tetraaryl-buta-1,3-diene derivatives in the soft segment (STMPU-25/STMPU-50/STMPU-75) have been synthesized and found to present aggregation-enhanced emission features. The fluorescence intensity of polymer films was greatly enhanced with increasing tensile stress. Also, polyurethanes with higher aggregation-induced emission fluorogen content had stronger mechano-fluorochromic behavior in the same tension state. Moreover, the resulting polyurethane films possessed high sensitivity for halogen acid gas, suggesting their potential applications in environmental monitoring fields.

Graphical abstract: Mechano-fluorochromic behavior of AEE polyurethane films and their high sensitivity to halogen acid gas
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