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Masked plasma oxidation: simple micropatterning of extracellular matrix in a closed microchamber array†
Koji Hattori,Ryosuke Yoshimitsu,Shinji Sugiura,Atsushi Maruyama,Kiyoshi Ohnuma,Toshiyuki Kanamori
RSC Advances Pub Date : 07/24/2013 00:00:00 , DOI:10.1039/C3RA42976H
Abstract

We present a simple micropatterning process to create a closed microchamber array with an extracellular matrix (ECM). The process includes homogeneous coating of the array with the ECM, micropatterned decomposition by plasma oxidation with physical masking, and subsequent sealing. These processes are sufficiently simple to enable scaled-up production of microchamber arrays coated with ECMs.

Graphical abstract: Masked plasma oxidation: simple micropatterning of extracellular matrix in a closed microchamber array
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