Mononuclear precursor for MOCVD of HfO2 thin films†
Arne Baunemann,Reji Thomas,Ralf Becker,Manuela Winter,Roland A. Fischer,Peter Ehrhart,Rainer Waser,Anjana Devi
Abstract
We report the precursor characteristics of a novel mononuclear mixed alkoxide compound [Hf(OiPr)2(tbaoac)2] and its application towards MOCVD of HfO2 thin films in a production tool CVD reactor.
