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NOx storage and reduction with methane by plasma at ambient temperature†
Hui Wang,Qinqin Yu,Tong Liu,Liping Xiao,Xiaoming Zheng
RSC Advances Pub Date : 04/04/2012 00:00:00 , DOI:10.1039/C2RA20115A
Abstract

NOx storage and reduction with CH4 by a plasma process was proposed for NOx removal at ambient temperature. The efficiency of this new process for NOx removal could achieve 95% at ambient temperature. NOx removal via cyclic operation has also been investigated, maintaining efficieniency above 90%.

Graphical abstract: NOx storage and reduction with methane by plasma at ambient temperature
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