Second-generation hexavalent molybdenum oxo-amidinate precursors for atomic layer deposition†
T. Jurca,A. W. Peters,A. R. Mouat,J. T. Hupp,T. L. Lohr,T. J. Marks
Dalton Transactions Pub Date : 12/22/2016 00:00:00 , DOI:10.1039/C6DT03952A
Abstract

The synthesis of molybdenum oxo-amidinate complexes MoO2(R2AMD)2 [AMD = N,N′-di-R-acetamidinate; R = Cy (2; cyclohexyl) and iPr (3)], and their characterization by 1H, 13C NMR, X-ray diffraction, and thermogravimetric analysis is reported. Quartz-crystal microbalance and X-ray photoelectron spectroscopic studies confirm that 3 is an improved ALD precursor versus the R = t-butyl derivative for MoO3 film growth. Complex 3 is accessible in higher yields (80%+), is easier to handle without mass loss, and in conjunction with O3 as the second ALD reagent, yields nitride-free MoO3 films.

Graphical abstract: Second-generation hexavalent molybdenum oxo-amidinate precursors for atomic layer deposition