960化工网
Cross-linkable linear copolymer with double functionality: resist for electron beam nanolithography and molecular imprinting†
S. Carrasco,V. Canalejas-Tejero,F. Navarro-Villoslada,C. A. Barrios,M. C. Moreno-Bondi
Journal of Materials Chemistry C Pub Date : 01/07/2014 00:00:00 , DOI:10.1039/C3TC31499E
Abstract

The first demonstration of a molecularly imprinted polymer patterned by electron beam lithography (EBL) direct writing is reported. The polymeric mixture is based on a linear co-polymer that behaves simultaneously as a positive-tone EBL resist and, after polymerization in the presence of rhodamine 123 (R123) as a model analyte, as a selective and sensitive synthetic receptor for the template. Analyte binding was evaluated by fluorescence confocal microscopy and the imprinting effect was confirmed in the presence of compounds structurally related to R123.

Graphical abstract: Cross-linkable linear copolymer with double functionality: resist for electron beam nanolithography and molecular imprinting
平台客服
平台客服
平台在线客服