960化工网
Passivation of high aspect ratio silicon nanowires by using catalytic chemical vapor deposition for radial heterojunction solar cell application
Gangqiang Dong,Yurong Zhou,Hailong Zhang,Fengzhen Liu,Guangyi Li,Meifang Zhu
RSC Advances Pub Date : 09/22/2017 00:00:00 , DOI:10.1039/C7RA08343B
Abstract

High aspect ratio silicon nanowires (SiNWs) prepared by metal-assisted chemical etching were passivated by using catalytic chemical vapor deposition (Cat-CVD). Film conformality of hydrogen amorphous silicon (a-Si : H) deposited by Cat-CVD on SiNWs was investigated and a relationship between the average length of SiNWs and the deposition time of a-Si : H was determined. By optimizing atomic H treatment and a-Si : H deposition on 1 μm length silicon nanowires, a-Si : H/SiNWs radial hetero-junction (RJ-HET) solar cells were fabricated and an efficiency of 16.02% was achieved. Compared with radial homo-junction (RJ-HOMO) solar cells and planar hetero-junction (P-HET) solar cells, the improvements of open circuit voltage and short circuit current of RJ-HET solar cells are discussed based on measurements of capacitance–voltage, dark current–voltage and quantum efficiency. The RJ-HET solar cell based on the SiNW array also shows better omni-directional antireflection properties than the P-HET solar cell.

Graphical abstract: Passivation of high aspect ratio silicon nanowires by using catalytic chemical vapor deposition for radial heterojunction solar cell application
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