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Evolution of non-ionic surfactant-templated silicate films at the air–liquid interface
Cristina Fernandez-Martin,Stephen J. Roser,Karen J. Edler
Journal of Materials Chemistry Pub Date : 01/24/2008 00:00:00 , DOI:10.1039/B716662A
Abstract

Spontaneous growth of non-ionic surfactant-templated thin films at the air–water interface was investigated using three techniques: Brewster angle microscopy (BAM), time-resolved off-specular X-ray reflectivity and grazing incidence X-ray diffraction (GIXD). Experiments were also carried out to study the evolution of micelles in the subphase solution using small-angle neutron scattering (SANS). Films were prepared in acidic conditions using octaethylene glycol mono-n-hexadecyl ether (C16EO8) as the surfactant and tetramethyloxysilane (TMOS) as the silica precursor. Three different TMOS–C16EO8 molar ratios (3.5, 7.1 and 10.8) were studied. Variation of the silica-precursor concentration causes a significant effect on the film-formation time, the solution and film-growth mechanisms and the final film structure.

Graphical abstract: Evolution of non-ionic surfactant-templated silicate films at the air–liquid interface
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