Five different lithium containing compounds, all representing different chemical systems, were studied in order to deposit lithium containing films by atomic layer deposition ALD. The studied compounds were a lithium β-diketonate Li(thd) (thd = 2,2,6,6-tetramethyl-3,5-heptanedionate), a lithium alkoxide LiO^tBu (O^tBu = tert-butoxide), a lithium cyclopentadienyl LiCp (Cp = cyclopentadienyl), a lithium alkyl n-butyllithium, and a lithium amide lithium dicyclohexylamide. Films containing lithium carbonate (Li₂CO₃) were obtained from alternate pulsing of Li(thd) and ozone in a temperature range of 185–300 °C. The film composition was analyzed by time-of-flight elastic recoil detection analysis (TOF-ERDA). The films grown at 225 °C were polycrystalline lithium carbonate as analyzed by X-ray diffraction (XRD). A 120 nm thick lithium carbonate film grown at 225 °C had a surface roughness of 19 nm as analyzed by AFM. Lithium lanthanate thin films were grown by combining the Li(thd) process with a ALD process for lanthanum oxide from La(thd)₃ and ozone. The film composition was varied by controlling the number of lithium carbonate and lanthanum oxide sub-cycles. Lithium containing films were also obtained from LiCp and water and from LiO^tBu and water.