Band modification of graphene by using slow Cs+ ions†
Sijin Sung,Sang-Hoon Lee,Paengro Lee,Jingul Kim,Heemin Park,Mintae Ryu,Namdong Kim,Choongyu Hwang,Seung-Hoon Jhi,Jinwook Chung
RSC Advances Pub Date : 01/06/2016 00:00:00 , DOI:10.1039/C5RA24482J
Abstract

We report new wide band gap engineering for graphene using slow Cs+ ions, which allows both fine-tuning and on–off switching capability of the band gap in a range suitable for most applications without modifying or deteriorating the relativistic nature of the Dirac fermions. The doping of Cs+ ions opens the band gap up to Eg = 0.68 eV, which can be closed completely by adding neutral Cs atoms, as observed in angle-resolved photoemission spectroscopy. The operating mechanism of this band gap engineering is understood by a simple capacitor model, which is fully supported by the density-functional theory calculations.

Graphical abstract: Band modification of graphene by using slow Cs+ ions