1327-50-0 (碲化锑,antimony(iii) telluride)

碲化锑;碲化锑(III);芴甲氧羰基-天冬氨酸-4环己脂;碲化锑(III), 痕量分析;碲化锑, 99% (METALS BASIS);碲化锑, 99.999% (METALS BASIS);碲化锑(III), 99.999% (METALS BASIS);

antimony(iii) telluride;antimony(+3) cation;Diantimony tritelluride;tellurium(-2) anion;Antimony sesquitelluride;Antimony telluride;Antimony tritelluride;Antimony(III) teluride.;Antimony(III) telluride lump;Antimony(III) telluride (Sb2Te3);ANTIMONY (III) TELLURIDE;Antimony(III) Telluride 99.999%;AntiMony(III) telluride (99.96%-Sb);Antimon(III)tellurid;Antimony(III) telluride, powder, 99.96% metals basis;Antimony Telluride Powder;MFCD00016320;D95637;1327-50-0;tellanylideneantimony;tellurium;Antimony(III) telluride, beads, >=99.99%;Antimony(III) telluride, powder, -325 mesh, 99.96% trace metals basis;Antimony(iii)telluride;Sb2Te3 Thin Film;Strontium Ruthenate (SrRuO3) Sputtering Targets;powder, 99.96% metals basis;

MFCD00016320

BPDQXJZWVBPDSN-UHFFFAOYSA-N

1S/2Sb.3Te

[Te].[Te]=[Sb].[Te]=[Sb] |^1:2,4|

215-480-9

MFCD00016320