2809-21-4 (羟基乙叉二膦酸,Etidronic acid)

羟基乙叉二膦酸;(1-羟基亚乙基)二膦酸;1,1-二膦酸基乙醇;1-羟基亚乙基-1,1-二磷酸;1-羟基乙烷二膦酸;1-羟基有乙叉-1,1-二磷酸;HEDP通用络合剂;羟基亚乙基二磷酸;羟基亚乙基二膦酸;羟基乙叉二膦酸(HEDP);1-羟基乙烷-1,1-二膦酸;HEDP羟基乙叉二膦酸;高纯羟基乙叉二膦酸 HEDP;羟基亚乙基二膦酸 HEDP;羟基亚乙基二膦酸有机磷类缓释阻垢剂;羟基乙叉二磷酸;羟基乙叉二膦酸 HEDP;羟基乙叉二膦酸 一水合物 （HEDP）;依替膦酸;乙烷-1-羟基-1,1-二磷酸;阻垢缓蚀剂羟基亚乙基二膦酸;1-羟基亚乙基-1,1-二膦酸;1-羟基乙叉-1,1-二磷酸;3-乙氧酰基苯胺甲磺酸盐;羟乙叉二膦酸;水质稳定剂HEDP;依替膦;乙二醇缓蚀剂;羟乙磷酸 (约60%于水中,约4.2mol/L);1-羟基亚乙基-1,1-二膦酸 (约60%于水中,约4.2mol/L);HEDP;RO 反渗透膜用阻垢剂;

(1-Hydroxyethane-1,1-diyl)diphosphonic acid;(1-hydroxyethylene)diphosphonicacid;(1-hydroxyethylidene)bis-phosphonicaci;(1-hydroxyethylidene)di-phosphonicaci;(hydroxyethylidene)diphosphonicacid;1,1,1-ethanetrioldiphosphonate;1000sl;1-hydroxy-1,1-diphosphonoethane;1-Hydroxyethanediphosphonica;HEDP;Etidronic acid monohydrate (HEDP);1-Hydroxyethylidenebis(phosphonic acid);(1-hydroxy-1-phosphonoethyl)phosphonic acid;1-Hydroxyethylidene-1,1-Diphosphonic Acid;1-HYDROXYETHYLIDENEDIPHOSPHONIC ACID;Etidronate;1-Hydroxyeth;1-hydroxyethane 1,1-diphosphonic acid;1-Hydroxyethane-1,1-diphosphonic acid;EHDP;ethane-1-hydroxy-1,1-diphosphonic acid;Ethyl 3-aMinobenzoate Methanesulfonate;Etidronic acid;Etidronic acid m;Etidronic acid Monohydrate;Etidronsaeure;HEDPA;Hydroxyethanediphosphonic acid;Oxyethylidenediphosphonic acid;Turpinal SL;Hydroxyethylidene diphosphonic acid;HDEPA;OEDFK;1-Hydroxyethylidenedi(phosphonic acid);Dequest 2010;Etidronic Acid (ca. 60% in Water, ca. 4.2mol/L);HDEPA (ca. 60% in Water, ca. 4.2mol/L);HEDP (ca. 60% in Water, ca. 4.2mol/L);1-Hydroxyethylidene-1,1-diphosphonic Acid (ca. 60% in Water, ca. 4.2mol/L);OEDFK (ca. 60% in Water, ca. 4.2mol/L);RO Scale inhibitor for reverse osmosis film;1-Hydroxy Ethylidene-1,1-Diphosphonic Acid (HEDP);NCGC00159352-02;s1857;DTXCID103028;NCGC00159352-14;Acide etidronique;DL-390;1,1-Ethylidenediphosphonic acid, 1-hydroxy-;Acido etidronico [INN-Spanish];Hydroxyethane-1,1-diphosphonic acid;ETIDRONIC ACID [HSDB];OEDP;(1-Hydroxy-1,1-ethanediyl)bis(phosphonic acid);(1-hydroxy-ethylidene)diphosphonic acid;ETIDRONIC ACID (MART.);Etidronsaure;Etidronate (Didronel);Prestwick1_000863;J-504794;SPBio_002826;Tox21_200417;DB01077;Etidronicacid;CCG-266618;NCGC00159352-06;HSDB 5898;GTPL7184;V10BX03;(1-Hydroxyethylene)diphosphonic acid;AKOS005524039;(1-Hydroxyethylidene)bisphosphonic acid;(1-Hydroxy-1-phosphono-ethyl)-phosphonic acid;BRD-K37949327-304-06-1;C07736;1-Hydroxyethane-1,1-bisphosphonic acid;Etidronic acid [USAN:INN:BAN];BSPBio_000905;NCGC00159352-04;M05BA01;(1-hydroxyethan-1,1-diyl)bis(phosphonic acid);BDBM50115102;STK721995;NS00006820;(1-hydroxy-1-phosphono-ethyl)phosphonic acid;Etidronic acid (USAN/INN);Ferrofos 510;1-Hydroxyethanediphosphonic acid;Prestwick0_000863;Diphosphonic Acid, Hydroxyethylidene;RP 61;NSC-227995;HY-B0302;EINECS 220-552-8;DTXSID6023028;Ethane-1-hydroxy-1,1-diphosphonate;UNII-M2F465ROXU;BRD-K37949327-001-06-3;1-Hydroxyethane-1,1-diphosphonate;Z1269201561;(1-Hydroxyethylidene)diphoshonic acid;etidronic-acid;Phosphonic acid, 1-hydroxy-1,1-ethanediyl ester;D02373;Phosphonic acid, (1-hydroxyethylidene)di-;CAS-2809-21-4;Phosphonic acid, P,P'-(1-hydroxyethylidene)bis-;(1-hydroxyethane-1,1-diyl)bis(phosphonic acid);s12329;(Hydroxyethylidene)diphosphonic acid;Acide etidronique [INN-French];Acidum etidronicum [INN-Latin];ethane-1-hydroxy-1,1-bisphosphonic acid;ETIDRONATE [VANDF];H0587;Acetodiphosphonic acid;NCGC00159352-05;1-hydroxyethane-1,1-diyldiphosphonic acid;Q2758338;CHEBI:4907;BRN 1789291;Ethane-1-hydroxy-1,1-bisphosphonate;NCGC00257971-01;C2H8O7P2;2809-21-4;2809-21-4 (freeacid);ETIDRONIC ACID [INN];MLS002695948;Acidum etidronicum;0-02-00-00171 (Beilstein Handbook Reference);SMR000038750;NSC 227995;Dequest 2015;Acido etidronico;Prestwick3_000863;Diphosphonate (base);(1-Hydroxyethylidene)diphosphonic acid;HMS3604E03;Etidronic Acid-d3;1-HydroxyEthylidene-1,1-DiphosphonicAcid;M2F465ROXU;NSC227995;1-Hydroxyethylidene-1,1-biphosphonate;(1-Hydroxyethylidene)bis(phosphonic acid);(1-Hydroxyethylidene)bisphosphonic acid 60% aqueous solution;ETIDRONIC ACID [MI];BBL028139;Prestwick2_000863;CHEMBL871;ETIDRONIC ACID [USAN];ETIDRONIC ACID [WHO-DD];hydroxyethylidene-1,1-diphosphonic acid;MLS002207267;A23202;EC 220-552-8;358730-93-5;Dequest Z 010;Etidronic Acid-d3 Sodium Salt;1-Hydroxyethylidene-1,1-bisphosphonate;MFCD00070585;(1-Hydroxyethane-1,1-diyl)diphosphonic acid monohydrate;Phosphonic acid, (1-hydroxyethylidene)bis-;ETIDRONIC ACID [MART.];SCHEMBL18607;BPBio1_000997;1,1,1-Ethanetriol diphosphonate;BRD-K37949327-001-07-1;

MFCD00070585

DBVJJBKOTRCVKF-UHFFFAOYSA-N

1S/C2H8O7P2/c1-2(3,10(4,5)6)11(7,8)9/h3H,1H3,(H2,4,5,6)(H2,7,8,9)

P(C(C)(O)P(=O)(O)O)(=O)(O)O

1789291

220-552-8

2931900090

HEDP是一种有机膦酸类阻垢缓蚀剂，能与铁、铜、锌等多种金属离子形成稳定的络合物，能溶解金属表面的氧化物。在250℃下仍能起到良好的缓蚀阻垢作用，在高pH下仍很稳定，不易水解，一般光热条件下不易分解。耐酸碱性、耐氯氧化性能较其它有机膦酸（盐）好。可与水中金属离子，尤其是钙离子形成六圆环螯合物，因而具较好的阻垢效果并具明显的溶限效应，当和其它水处理剂复合使用时，表现出理想的协同效应。HEDP固体属于高纯产品，适用于冬季严寒地区；特别适用于电子行业的清洗剂和日用化学品添加剂。

1.由三氯化磷与冰醋酸混合后,加热、蒸馏,得乙酰氯(见00510),再与亚磷酸反应制得。市售品为以水稀释为含量50%的粘稠液体。每吨产品消耗三氯化磷(95%)931kg,冰醋酸591kg。 2.由三氯化磷、冰乙酸和水反应制得。或者由正磷酸、乙酐和乙酰氯反应制得。也可以由亚磷酸和乙酐反应制得。还可以由正磷酸和乙酐反应。 3.工业上通常采用冰醋酸与三氯化磷酰基化,再由酰基化产物与三氯化磷水解产物缩合法。将计量的水,冰醋酸加入反应釜中,搅拌均匀。在冷却下滴加三氯化磷,控制反应温度在40～80℃。反应副产物氯化氢气体经冷凝后送入吸收塔,回收盐酸。溢出的乙酰氯和醋酸经冷凝仍回反应器。滴完三氯化磷后,升温至100～130℃,回流...

1789291

1789291