99614-14-9 (1,2,3,9-四氢-3-[(2-甲基-1H-咪唑-1-基)甲基]-4H-咔唑-4-酮,N-Demethyl Ondansetron)

1,2,3,9-四氢-3-[(2-甲基-1H-咪唑-1-基)甲基]-4H-咔唑-4-酮;1,2,3,9-四氢-9-甲基-3-[(2-甲基-1H-咪唑-1-基)甲基]-4H-咔唑-4-酮;吡草醚;恩丹西酮EP杂质H;盐酸昂丹司琼杂质H(EP) 标准品;盐酸蒽丹西酮杂质H;1,2,3,9-四氢-3-[(2-甲基-1H-咪唑-1-基)]-4H咔唑-4-酮;

1,2,3,9-Tetrahydro-3-[(2-methyl-1H-imidazole-1-yl)methyl]-4H-carbazol-4-one;N-Demethyl Ondansetron;DesMethylondansetron;N-Desmethylondansetron;1,2,3,9-Tetrahydro-3-[(2-methyl-1H-imidazole-1)methyl]-4H-carbazol-4-one;(3RS)-3-((2-Methyl-1H-imidazol-1-yl)methyl)-1,2,3,9-tetrahydro-4H-carbazol-4-one;3-[(2-methylimidazol-1-yl)methyl]-1,2,3,9-tetrahydrocarbazol-4-one;31S56S12GI;99614-14-9;SCHEMBL3994101;Ondansetron Hydrochloride Dihydrate Imp. H (EP); Ondansetron Imp. H (EP); (3RS)-3-[(2-Methyl-1H-imidazol-1-yl)methyl]-1,2,3,9-tetrahydro-4H-carbazol-4-one; N-Demethylondansetron; Ondansetron Hydrochloride Dihydrate Impurity H; Ondansetron Impurity H;4H-Carbazol-4-one, 1,2,3,9-tetrahydro-3-((2-methyl-1H-imidazol-1-yl)methyl)-;AKOS015967235;Ondansetron hydrochloride dihydrate impurity H [EP];UNII-31S56S12GI;(3RS)-3-[(2-Methyl-1H-imidazol-1-yl)methyl]-1,2,3,9-tetrahydro-4H-carbazol-4-one (N-Demethylondansetron);FT-0665730;ONDANSETRON HYDROCHLORIDE DIHYDRATE IMPURITY H [EP IMPURITY];NTOYQHBABVCYMC-UHFFFAOYSA-N;DTXSID301145416;3-((2-methyl-1H-imidazol-1-yl)methyl)-2,3-dihydro-1H-carbazol-4(9H)-one;A846053;1,2,3,9-Tetrahydro-3-[(2-methyl-1H-imidazol-1-yl)methyl]-4H-carbazol-4-one;Q27256076;3-((2-methyl-1H-imidazol-1-yl)methyl)-1,2,3,9-tetrahydro-4H-carbazol-4-one;

NTOYQHBABVCYMC-UHFFFAOYSA-N

1S/C17H17N3O/c1-11-18-8-9-20(11)10-12-6-7-15-16(17(12)21)13-4-2-3-5-14(13)19-15/h2-5,8-9,12,19H,6-7,10H2,1H3

O=C1C2C3C=CC=CC=3NC=2CCC1CN1C=CN=C1C

2933990090