Photolabile protecting groups in metal–organic frameworks: preventing interpenetration and masking functional groups†‡
Rajesh K. Deshpande,Geoffrey I. N. Waterhouse,Geoffrey B. Jameson,Shane G. Telfer
Chemical Communications Pub Date : 07/22/2011 00:00:00 , DOI:10.1039/C1CC12884A
Abstract

Photolabile groups can be incorporated into metal–organic frameworks (MOFs) and then quantitatively cleaved following MOF formation. Here, a 2-nitrobenzyl ether prevents lattice interpenetration (catenation) in a cubic MOF derived from zinc(II). Subsequent photolysis unmasks a hydroxyl group, and produces an open MOF that cannot be synthesized directly.

Graphical abstract: Photolabile protecting groups in metal–organic frameworks: preventing interpenetration and masking functional groups