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A metal-organic chemical vapor deposition approach to double-sided Tl2Ba2Ca1Cu2O8 superconducting films on LaAlO3 (100) substrates
Graziella Malandrino,Anna M. Borzì,Ignazio L. Fragalà,Antonello Andreone,Antonio Cassinese,Giulia Pica
Journal of Materials Chemistry Pub Date : 10/15/2002 00:00:00 , DOI:10.1039/B206039F
Abstract

Double-sided Tl2Ba2CaCu2O8 (Tl-2212) films for device applications have been fabricated through thallium vapor diffusion into BaCaCuOF matrices deposited by a novel metal-organic chemical vapor deposition (MOCVD) process onto 10 × 10 mm2 LaAlO3 (100) substrates. The present approach uses a multimetal molten single source in a monocomponent hot-wall MOCVD reactor whose geometry allows simultaneous and uniform film growth on both sides of the substrate. Both sides are epitaxially coated by homogeneous and monophasic Tl-2212 films, which, even more importantly, have comparable superconducting and transport properties.

Graphical abstract: A metal-organic chemical vapor deposition approach to double-sided Tl2Ba2Ca1Cu2O8 superconducting films on LaAlO3 (100) substrates
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