依托非那敏杂质D(64352-84-7)名称与标识符
名称
中文别名：
依托芬那酯杂质D;依托芬那酯杂质D(EP) 标准品;2-[[3-(三氟甲基)苯基]氨基]苯甲酸 氧基二-2,1-乙二基酯;依托非那酯EP杂质D;依托芬那酯杂质4(依托芬那酯EP杂质D);依托芬那酯EP杂质D;
英文别名：
Imp. D (EP): 2,2'-Oxybis(ethylene) Bis[2-[[3-(trifluoromethyl)phenyl]amino]benzoate];2,2'-Oxybis(ethylene) Bis[2-[[3-(trifluoromethyl)phenyl]amino]benzoate];2-[2-[2-[3-(trifluoromethyl)anilino]benzoyl]oxyethoxy]ethyl 2-[3-(trifluoromethyl)anilino]benzoate;CID 129318388;Etofenamate EP Impurity D;2,2-Bis(N-(a,a,a-trifluoro-m-tolyl)antranililoxi)diethylether;2-[[3-(Trifluoromethyl)phenyl]amino]benzoic acid oxydi-2,1-ethanediyl ester;2,2'-Oxybis(ethylene) Bis[2-[[3-(tr;Benzoic acid, 2-[[3-(trifluoromethyl)phenyl]amino]-, oxydi-2,1-ethanediyl ester (9CI);oxybis(ethane-2,1-diyl) bis(2-((3-(trifluoromethyl)phenyl)amino)benzoate);Etofenamate Impurity 4 (Etofenamate EP Impurity D);Etofenamate - Impurity DQ: What is
Etofenamate - Impurity D Q: What is the CAS Number of
Etofenamate - Impurity D;
标识符
InChIKey：
KKGKTVVZWJTHAO-UHFFFAOYSA-N
Inchi：
1S/C32H26F6N2O5/c33-31(34,35)21-7-5-9-23(19-21)39-27-13-3-1-11-25(27)29(41)44-17-15-43-16-18-45-30(42)26-12-2-4-14-28(26)40-24-10-6-8-22(20-24)32(36,37)38/h1-14,19-20,39-40H,15-18H2
SMILES：
FC(C1=CC=CC(=C1)NC1=CC=CC=C1C(=O)OCCOCCOC(C1=CC=CC=C1NC1C=CC=C(C(F)(F)F)C=1)=O)(F)F
2590956145 
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